Chemical vapor deposition technology has advanced at a rapid rate, and the number and scope of its applications and their impact on the market have increased significantly. The process is now a key factor in many industries — in fact, the size of the CVD market had more than doubled in the seven years since the original edition of the Handbook of Chemical Vapor Deposition was published.

This revised and expanded edition examines chemical vapor deposition (CVD), an extremely versatile process for manufacturing coatings, fibers, powders, and monolithic components. It discusses fundamentals, chemistry, processes and equipment, addressing a wide variety of applications. There is a wealth of new material on plasma CVD and metallo-organic CVD (MOCVD), as well as applications in the semiconductor industry. The second edition also reviews in depth the recent expansion of the number of materials produced by CVD, including copper, tungsten, diamond, silicon carbide, silicon nitride, titanium nitride, and others.

From the Preface: “...The reasons for the success of CVD are simple. CVD is a relatively uncomplicated and flexible technology which can addomodate many variations. With CVD, it is possible to coat almost any shape of almost any size. Unlike other thin film techniques such as sputtering CVD can also be used to produce fibers, monoliths, foams and powders. CVD is economically competitive...”

Target Audience: Engineers, researchers, students, and technologists in the semiconductor, optoelectronic, optics, cutting tool, refractory fibers, and other industries.

Table of Contents:

Introduction and General Considerations

Fundamentals of Chemical Vapor Deposition

The Chemistry of CVD

Metallo-Organic CVD (MOCVD)

CVD Processes and Equipment

The CVD of Metals

The CVD of the Allotropes of Carbon

The CVD of Non-Metallic Elements

The CVD of Ceramic Materials: Carbides

The CVD of Ceramic Materials: Nitrides

The CVD of Ceramic Materials: Oxides

The CVD of Ceramic Materials: Borides, Silicides, III—V Compounds and II—VI Compounds (Chalcogenides)

CVD in Electronic Applications: Semiconductors

CVD in Electronic Applications: Conductors, Insulators, and Diffusion Barriers

CVD in Optoelectronic and Ferroelectric Applications

CVD in Optical Applications

CVD in Wear- and Corrosion-Resistant Applications

CVD in Cutting-Tool Applications

CVD in Fiber, Powder, and Monolithic Applications

Conversion Guide

Appendix: Alternative Processes for Thin-Film Deposition and Surface Modification

Index