This volume offers bountiful information and represents a current commentary on the research and development activity taking place regarding the adhesion of particles to surfaces, and of their detection and removal. The papers were originally presented at the 5th and 6th Symposia on Particles and Surfaces, held under the aegis of the Fine Particle Society in Chicago (May 6-9, 1996) and Dallas (April 1-3, 1998), respectively. The removal of particles from a host of surfaces was highlighted, with a focus on the need to remove smaller and smaller particles. All papers have undergone peer review, and those which were presented in 1996 have been updated as needed to make them current.

From the Preface: “...Both of these symposia elicited an excellent response, which is a testimonial to the brisk R&D activity and interest apropos of particles on surfaces. The technical programs clearly reflected an interest and need to amerliorate the existing methods and to devise new and more efficient ways to detect, analyze and characterize particles on surfaces...”

Target Audience: Scientists, technologists, and upper-level students concerned with the adhesion, detection, and removal of fine particles on surfaces.

Table of Contents:

General Papers:

High Sensitivity Rapid Detection of Particulate Contamination

Detection of Particles on Surfaces Using Evanescent Wave Scattering

Metallic Contamination from Particles on the Backside of Wafers

The Effect of Fluid Dynamics on Particle Shedding from Semiconductor Fluid-Handling Components

Influence of Surface Charge on Particle Dispersion/Aggregation as Determined by Atomic Force Microscopy

Synthesis of Composite Particles by a Dry Coating Technique

Particle Adhesion and Removal:

Particles, Surfaces and Turbulent Fluid Flow: The Dynamics of Adhesion

The Role of Cetyl Pyridinium Chloride in Reducing Adhesion Forces Between Alumina Particles and Quartz Surfaces

The Effects of Various Surfactants on the Adhesion of Fine Particles to Polycarbonate Lenses and on the Scratches Produced During Wiping Processes

Precision Cleaning and Processing in Industrial Applications

Co-Solvents in Supercritical Fluids for Enhanced Effectiveness in Particle Removal

Hydrodynamic Removal of Fine Particles from Solid Surfaces

Study of High-Speed Droplet Impingement on Solid Surfaces

Measurements and Modelling of Megasonic Cleaning Processes

Carbon Dioxide (Dry-Ice) Particle Blasting as a Mainstream Cleaning Alternative

Carbon Dioxide Snow Cleaning

Argon Aerosol Surface Cleaning: An Overview

Development and Optimization of a Cryogenic Aerosol-Based Wafer Cleaning System

Radiance Process Evaluation for Particle Removal

Chemically Assisted Laser Removal of Photoresist and Particles from Semiconductor Wafers

Removal of Particulate Contamination from Silicon Surfaces with Laser-Based Cleaning Technology

Removal of Particulate and Film Contaminants by Impacting Surfaces with Microcluster Beams

Post-CMP Particle Removal Using a Capella Brush Cleaner

Particle Removal from Semiconductor Surfaces by Chemical-Mechanical Cleaning: Setting the Record Straight