With electronic, optical, and magnetic coating technologies assuming ever-increasing importance in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world.

Physical Vapor Deposition of Thin Films presents a unified treatment of the theories, data, and technologies which are critical to this field. It incorporates important results from across the literature, imparting a working knowledge of a variety of currently employed and emerging techniques. Specific topics include thermal evaporation, sputtering, and pulsed laser deposition methods; trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets; quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam; and more.

From the Preface: “...This book is more a reference than a text, although there are worked examples that, I hope, make it clear exactly how to calculate things. In most of my treatments of technical subjects, I start with basic experimental data or theories (usually of a classic stature), discuss underlying mechanisms and processes, and finally give the reader the ability to quantitatively model the practical applications...”

Target Audience: Manufacturing, design, process, chemical, mechanical, and materials engineers; students of thin film deposition; and other readers concerned with physical vapor deposition.

Table of Contents:

Introduction to Physical Vapor Deposition

The Kinetic Theory of Gases

Adsorption and Condensation

Principles of High Vacuum

Evaporation Sources

Principles of Sputtering Discharges

Sputtering

Film Deposition

Index