This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal, held in Newark, NJ June 19-21, 2000. It is divided into two parts: the first addresses particle analysis and general cleaning-related topics, while the more voluminous second section focuses on particle adhesion and removal. The book offers a wealth of cutting-edge information on this field, which is extremely important in a host of diverse technological areas, including microelectronics, optics, and biomedical engineering.

From the Preface: “...[W]ith the shrinking feature sizes in microelectronic devices, the need to remove smaller particles is quite manifest. Also with the decreasing flying height between the head and the disk in information storage field, the removal of real small (nanoscale) particles is of cardinal importance. With the current burgeoning interest in nanotechnologies, the understanding of the behavior of nanoparticles and the need to devise efficient ways to remove such particles cannot be overemphasized...”

Target Audience: Scientists, technologists, and upper-level students concerned with the adhesion, detection, and removal of fine particles on surfaces.

Table of Contents:

Particle Analysis and General Cleaning-Related Topics:

Applying Surface Analysis Techniques for Particle Identification

Total Reflection and Grazing Emission X-Ray Fluorescence Spectrometry: Assessment of the Size of Contamination Particles on Silicon Wafer Surfaces

Development of a Particle Deposition Meter

Reduction of Cleaning and Verification Times for an Aqueous Based Process by On-Line Monitoring

Implementation of the IMEC-Cleaning in Advanced CMOS Manufacturing

Cleaning, Rinsing and Drying Issues in Post-Cu CMP Cleaning: A Case Study

Aging Effects in Test Silicon Wafers Prepared for Wafer Cleaning Process Evaluation

Particle Adhesion and Removal:

Adhesion of Small Particles and Innovative Methods for their Removal

Effect of Surface Roughness on van der Waals and Electrostatic Contributions to Particle-Particle Interactions and Particle Adhesion

Adhesion and Removal of Particles from Charged Surfaces Under a Humidity-Controlled Air Stream

Adhesion Measurements by AFM and Surface Energy Characteristics by IGC of Xerographic Toner Particles Under Different Mechanical and Environmental Conditions

Measurements of Adhesion Forces in Pharmaceutical Powder—Polymer Systems by Atomic Force Microscopy

Direct Adhesion Measurements Between Pharmaceutical Materials

Laser Assisted Particle Removal

Laser Removal of Particles from Solid Surfaces

Laser Assisted Particle Removal from Silicon Wafers

Laser Cleaning of Silicon Membrane Stencil Masks

Transient Layer-Based Surface Acceleration Simulations for Particle Removal

Particle Removal from Semiconductor Substrates Using the PLASMAX Technology

Particle Removal with Ultrasonics and Megasonics

Influence of Temperature and Dissolved Air on Megasonic Particle Removal

A Study of Particle Removal Based on Monte Carlo Simulation of Ion Interactions

Removal of Fibrin Coated Particles from Surfaces

Enhancement of Particle Removal and Modification of Interfacial Phenomena Using Surfactants

The Enhancement of Particle Removal by Adding Valtron SP2200 Surfactant into SC1 Solution

Optimization of Particle Removal Performance of dHF-Based Cleaning Recipes

Spray Cleaning with Hydrofluorocarbon Solutions