This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, NJ, May 23-25, 2001. It contains 24 peer-reviewed papers, dealing with all kinds of contamination on a host of surfaces, as well as methods for surface evaluation and effects of various cleaning techniques.

From the Preface: “...The ubiquitous nature of surface contamination causes concern to everyone dealing with surfaces, and the world of surfaces is wide and open-ended. A contaminant is defined as `unwanted matter or energy' or `material or energy in the wrong place'. Also, contaminants can be broadly classified as: film-type, particulates; ionic, and biological or microbial. The technological areas where surface contamination has always been a bete noir and thus surface cleaning is of cardinal importance...range from aerospace to microelectronics to biomedical...”

Target Audience: Academic and industrial technologists and scientists, as well as upper-level students, interested in the technologically important field of surface contamination and cleaning.

Table of Contents:

Mapping of Surface Contaminants by Tunable Infrared-Laser Imaging

Monitoring Cleanliness and Defining Acceptable Cleanliness Levels

Tracking Surface Ionic Contamination by Ion Chromatography

A New Method Using MESERAN Technique for Measuring Surface Contamination After Solvent Extraction

Methods for Pharmaceutical Cleaning Validations

Influence of Cleaning on the Surface of Model Glasses and Their Sensitivity to Organic Contamination

Decontamination of Sensitive Equipment

The Fundamentals of No-Chemistry Process Cleaning

Development of a Technology for Generation of Ice Particles

Cleaning with Solid Carbon Dioxide Pellet Blasting

Development of a Generic Procedure for Modeling of Waterjet Cleaning

Experimental and Numerical Investigation of Waterjet Derusting Technology

Practical Applications of Icejet Technology in Surface Processing

Correlating Cleanliness to Electrical Performance

Qualifying a Cleaning System for Space Flight Printed Wiring Assemblies

Investigation of Modified SC-1 Solutions for Silicon Wafer Cleaning

Performance Qualification of Post-CMP Cleaning Equipment in a Semiconductor Fabrication Environment

Spatial and Temporal Scales in Wet Processing of Deep Submicrometer Features

Microdenier Fabrics for Cleanroom Wipers

Fine Particle Detachment Studied by Refrectometry and Atomic Force Microscopy

Dust Removal from Solar Panels and Spacecraft on Mars

Laser Cleaning of Silicon Wafers: Prospects and Problems

Particle Removal Using Resonant Laser Detachment

The Future of Industrial Cleaning and Related Public Policy-Making