This reference provides in-depth coverage of luminous chemical vapor deposition (LCVD) and showcases the development and utilization of LCVD procedures in industrial scale applications — it offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative technology. The book provides broad coverage of the complex subjects and principles in material formation and deposition, surface-state of solid materials, surface dynamics of plasma-modified surfaces, imperturbable surface-states, interface engineering, the use of LCVD in the design of biomaterials, and more.

From the Preface: “...Upon publication of [Plasma Polymerization, Academic Press, 1985], the author had a well established concept that plasma polymerization is not an ionization driven chemical process, but a chemical process driven by the dissociation of molecules caused by the impact of low energy electrons — but could not find the decisive phenomenon to support the concept...The author hopes this book will provide enough impetus for pursuit of the truth in the ever-expanding inter-disciplinary domains of luminous chemical vapor deposition and interface engineering...”

Target Audience: Chemical and materials engineers and technologists; researchers involved in nanofilm technology, biomaterials, microsensors, microelectronics, corrosion avoidance, composite materials, and selective membranes and barriers; and upper-levels students in these disciplines.

Table of Contents:

Fundamentals of LCVD:

Introduction

Domain of Luminous Chemical Vapor Deposition

Luminous Gas Phase

Creation of Chemically Reactive Species in Luminous Chemical Vapor Deposition

Growth and Deposition Mechanisms

Dangling Bonds

Chemical Structures of Organic Compounds for Luminous Chemical Vapor Deposition

Deposition Kinetics

Ablation by Luminous Gas (Low Pressure Plasma)

Competitive Ablation and Polymerization

Internal Stress in Material Formed by Luminous Chemical Vapor Deposition

Operation of LCVD and LCVT

Modes of Operation and Scale-Up Principle

Direct Current and Alternating Current Discharge

Magnetron Discharge for Luminous Chemical Vapor Deposition

Anode Magnetron Discharge

Low-Pressure Cascade Arc Torch

Anode Magnetron Torch

Primary, Secondary and Pulsed Discharges

Reactor Size

Flow Pattern

Composition-Graded Transition Phase

Tumbler Reactor

Fundamentals of Surface and Interface:

Surface Configuration

Surface State

Surface Dynamics

Contact Angle and Wettability

Sessile Bubble Formation and Detachment

Interface Engineering:

System Approach Interface Engineering

Creation of an Imperturbable Surface

Creating Adhesion to Substrate Surface

Corrosion Protection of Aluminum Alloys

Corrosion Protection of Ion Vapor-Deposited Aluminum

Corrosion Protection of Cold-Rolled Steel and Pure Iron

Membrane Preparation and Modification

Application of Luminous Chemical Vapor Deposition in Biomaterials

Economical Advantages of Luminous Chemical Vapor Deposition

Index